The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 24, 1976
Filed:
May. 03, 1974
Applicant:
Inventor:
Rudolf August Heinecke, Harlow, EN;
Assignee:
ITT Industries, Inc., New York, NY (US);
Primary Examiner:
Int. Cl.
CPC ...
B05D / ;
U.S. Cl.
CPC ...
427 38 ; 156-7 ; 156-8 ; 156 17 ; 427 41 ; 427271 ;
Abstract
This invention relates to a method of selectively treating the surface of an article comprising silicon in part and either silica or silicon nitride in part wherein either the silicon or the silicon compound is etched at a greater rate or a fluoropolymer is deposited on the article by placing the article in a plasma containing fluorine, carbon and reducing species and adjusting the concentration of the reducing species to selectively etch the silicon at a greater rate, etch the silicon compound at a greater rate or deposit polymer.