The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 10, 1976
Filed:
Nov. 19, 1973
Tsutomu Irikura, Tokyo, JA;
Kazunari Shirai, Tokyo, JA;
Mamoru Tada, Urawa, JA;
Terumi Tamada, Tokyo, JA;
Jun Imai, Ageo, JA;
Abstract
A process for preparing a pyrogen-free plasma substitute consisting of treating hydroxyethyl starch having a DS of 0.5 - 0.6 (preferably 0.55) and an intrinsic viscosity of 0.28 - 0.30 with an acid to lower the molecular weight; adjusting it to the desired hydroxyethyl starch having a DS of 0.55 and an intrinsic viscosity of 0.08- 0.14; adding a depyrogen reagent, such as Raney-nickel to it, if necessary, obtaining an isotonic aqueous solution containing 6% of hydroxyethyl starch and other various salts, preferably, adding sodium chloride (0.5%), potassium chloride (0.03%), calcium chloride dihydrate (0.02%), sodium lactate (0.224%), and glucose (1%)(W/V%) to 6% hydroxyethyl starch solution; and then adjusting the pH of the obtained iostonic aqueous solution to 6.2 .+-. 0.5.