The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 03, 1976
Filed:
Apr. 30, 1975
Applicant:
Inventor:
Josef Kazimierz Tylko, Faringdon, EN;
Assignee:
Tetronics Research and Development Co. Ltd., Faringdon, EN;
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H05B / ;
U.S. Cl.
CPC ...
13 / ; 2191 / ;
Abstract
A plasma arc furnace in which an expanded plasma column is generated between at least one orbiting electrode moving in a substantially circular path and a stationary electrode. The orbiting electrode is directed towards the orbital axis so as to generate a plasma column having a portion of generally inverted conical shape in the vicinity of the orbiting electrode and feedstock is introduced into the upper end of the plasma column. The orbiting electrode may be directed across the orbital axis whereby the generated plasma column is in the form of two generally conical portions meeting at a common apex.