The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 03, 1976
Filed:
Dec. 27, 1973
Applicant:
Inventors:
Hans-Jurgen Rosenkranz, Krefeld, DT;
Hans Rudolph, Krefeld-Bockum, DT;
Erich Wolff, Leichlingen, DT;
Harald VON Rintelen, Leverkusen, DT;
Assignee:
Bayer Aktiengesellschaft, , DT;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
C08F / ; C08F / ; C08F / ; C08F / ;
U.S. Cl.
CPC ...
260 / ; 96 8 / ; 96 88 ; 96114 ; 204122 ; 260 / ; 260 / ; 260 / ; 260 / ; 260 / ; 260 807 ; 260 8073 ; 260 8075 ; 260 835 ; 260 8555 ; 260 857 ; 260 / ; 260 877 ; 260 / ; 260 / ;
Abstract
Photosensitive polymers and their process of preparation which can be crosslinked by a vinyl polymerization initiated by photochemical means and which are derived from the reaction of polymers containing zerewitinoff-active hydrogen atoms with N-methylol compounds or with N-Methylol ethers of acrylamides or substituted acrylamides. The modified polymers optionally in admixture with other vinyl group containing monomers are useful for purposes such as photosensitive copying layers, coatings and molded articles.