The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 10, 2026

Filed:

Feb. 22, 2023
Applicant:

Kabushiki Kaisha Toshiba, Tokyo, JP;

Inventors:

Yosuke Kajiwara, Yokohama Kanagawa, JP;

Hiroshi Ono, Setagaya Tokyo, JP;

Daimotsu Kato, Kawasaki Kanagawa, JP;

Aya Shindome, Yokohama Kanagawa, JP;

Masahiko Kuraguchi, Yokohama Kanagawa, JP;

Assignee:

KABUSHIKI KAISHA TOSHIBA, Kawasaki, JP;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H10D 62/824 (2025.01); H10D 62/85 (2025.01); H10D 64/27 (2025.01); H10P 14/20 (2026.01); H10P 14/692 (2026.01);
U.S. Cl.
CPC ...
H10D 62/824 (2025.01); H10D 62/8503 (2025.01); H10D 64/516 (2025.01); H10P 14/3416 (2026.01); H10P 14/69215 (2026.01); H10P 14/69391 (2026.01);
Abstract

According to one embodiment, a semiconductor device includes a first electrode, a second electrode, a third electrode, a first semiconductor region, a second semiconductor region, a first layer, a second layer, and a first insulating layer. The third electrode includes a first electrode portion. The first semiconductor region includes AlGaN (0≤x1<1). The first semiconductor region includes a first partial region, a second partial region, a third partial region, a fourth partial region and a fifth partial region. The second semiconductor region includes AlGaN (x1<x2≤1). The second semiconductor region includes a first semiconductor portion and a second semiconductor portion. The first layer includes Al and N. The first layer includes a first compound region. The second layer includes Al, Si, O and N. The second layer includes a first intermediate region. The first insulating layer includes Si and O.


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Kajiwara, Yosuke. (2026). Semiconductor device (U.S. Patent No. 12796037). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/12796037

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