The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 10, 2026
Filed:
Sep. 18, 2020
Kokusai Electric Corporation, Tokyo, JP;
Nobuo Ishimaru, Toyama, JP;
KOKUSAI ELECTRIC CORPORATION, Tokyo, JP;
Abstract
Described herein is a technique capable of reducing a damage to a reaction tube and an electrode when processing a substrate using plasma as well as generating the plasma stably. According to one aspect thereof, there is provided a substrate processing apparatus including: a process chamber; a buffer chamber where a gas is circulated before being supplied to a substrate; a pair of discharge electrodes extending parallel to each other in the buffer chamber; and a pair of sheath tubes configured to cover the pair of the discharge electrodes to prevent them from being exposed to the gas. A metal cap, whose outer diameter is equal to that of the discharge electrode and whose front end is rounded, is provided at one end of one or each of the discharge electrodes other than the other end of the one or each of the discharge electrodes supplied with electric power.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile