Substrate processing apparatus, liquid source replenishment system, substrate processing method, method of manufacturing semiconductor device and non-transitory computer-readable recording medium

Abstract

A substrate processing apparatus includes: a vaporization vessel; a liquid source replenishment line whose first end is connected to the vaporization vessel and whose second end is connected to a supply source of a liquid source; a first valve provided at the replenishment line; a second valve provided at the replenishment line and upstream of the first valve; a liquid source storage provided between the first valve and the second valve; and a controller for controlling opening and closing operations of the first valve and the second valve to supply the liquid source into the vaporization vessel by performing: (a) filling the liquid source storage with the liquid source by opening the second valve while the first valve is closed; and (b) closing the second valve after (a) and discharging the liquid source into the vaporization vessel by opening the first valve.