The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 10, 2026
Filed:
Mar. 16, 2022
Applicant:
Samsung Sdi Co., Ltd., Yongin-si, KR;
Inventors:
Sunghwan Kim, Suwon-si, KR;
Yushin Park, Suwon-si, KR;
Sunyoung Yang, Suwon-si, KR;
Yongsik Yoo, Suwon-si, KR;
Assignee:
Samsung SDI Co., Ltd., Yongin-si, KR;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
C09D 161/02 (2006.01); C08G 6/00 (2006.01); G03F 7/11 (2006.01);
U.S. Cl.
CPC ...
C09D 161/02 (2013.01); C08G 6/00 (2013.01); G03F 7/11 (2013.01);
Abstract
A hardmask composition, a hardmask layer, and a method of forming patterns, the hardmask composition including a polymer and a solvent, wherein the polymer includes a structural unit represented by Chemical Formula 1:
Quick Actions:
Kim, Sunghwan. (2026). Hardmask composition, hardmask layer and method of forming patterns (U.S. Patent No. 12790509). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/12790509
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile