The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 10, 2026
Filed:
Dec. 19, 2022
Applicant:
Samsung Electronics Co., Ltd., Suwon-si, KR;
Inventors:
Minsang Kim, Suwon-si, KR;
Haengdeog Koh, Suwon-si, KR;
Yoonhyun Kwak, Suwon-si, KR;
Chanjae Ahn, Suwon-si, KR;
Jungha Chae, Suwon-si, KR;
Sungwon Choi, Suwon-si, KR;
Minyoung Ha, Suwon-si, KR;
Assignee:
Samsung Electronics Co., Ltd., Gyeonggi-do, KR;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/038 (2006.01); C07C 381/12 (2006.01); C08F 212/14 (2006.01); C08F 220/18 (2006.01); G03F 7/039 (2006.01);
U.S. Cl.
CPC ...
C08F 220/1807 (2020.02); C07C 381/12 (2013.01); C08F 212/24 (2020.02); G03F 7/038 (2013.01); G03F 7/039 (2013.01);
Abstract
Provided are a polymer including a repeating unit represented by Formula 1, a photoresist composition including the polymer, and a method of forming a pattern by using the photoresist composition: wherein the details of R, L, a, A, and Bin Formula 1 are provided in the present specification.
Quick Actions:
Kim, Minsang. (2026). Polymer, photoresist composition including the same, and method of forming pattern using the photoresist composition (U.S. Patent No. 12790424). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/12790424
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile