The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 03, 2026

Filed:

Dec. 20, 2023
Applicant:

Screen Holdings Co., Ltd., Kyoto, JP;

Inventors:

Kazuki Nakamura, Kyoto, JP;

Yoshifumi Okada, Kyoto, JP;

Nobuaki Okita, Kyoto, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B08B 1/12 (2024.01); A46B 13/00 (2006.01); A46B 13/02 (2006.01); B08B 1/20 (2024.01); B08B 1/36 (2024.01); B08B 3/02 (2006.01); B08B 3/04 (2006.01); B08B 13/00 (2006.01); H01L 21/67 (2006.01); H10P 70/00 (2026.01); H10P 72/00 (2026.01); H10P 72/76 (2026.01);
U.S. Cl.
CPC ...
H10P 72/7611 (2026.01); A46B 13/008 (2013.01); A46B 13/02 (2013.01); B08B 1/12 (2024.01); B08B 1/20 (2024.01); B08B 1/36 (2024.01); B08B 3/022 (2013.01); B08B 3/041 (2013.01); B08B 13/00 (2013.01); H10P 70/20 (2026.01); H10P 72/0412 (2026.01); H10P 72/0414 (2026.01); H10P 72/0604 (2026.01); H10P 72/7602 (2026.01); H10P 72/7612 (2026.01); A46B 2200/3073 (2013.01); B08B 2203/02 (2013.01);
Abstract

A substrate processing device includes a plurality of cleaning devices and a main robot. The main robot is configured to carry a substrate into and carrying the substrate out from each substrate cleaning device. The substrate cleaning device includes a processing chamber. In the processing chamber, a brush cleaner that brings a brush into contact with a lower surface of the substrate to clean the lower surface of the substrate is provided. Further, the substrate cleaning device has a cleaning nozzle that discharges a brush cleaning liquid to the brush. In a period during which the substrate carry-in operation and the substrate carry-out operation are performed with respect to the substrate cleaning device by a main robot, supply of the brush cleaning liquid to the cleaning nozzle is stopped.


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Nakamura, Kazuki. (2026). Substrate processing device and substrate processing method (U.S. Patent No. 12787710). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/12787710

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