Semiconductor devices

Abstract

A semiconductor device includes a substrate including an active region extending in a first direction, a gate structure extending in a second direction intersecting the active region on the substrate and including a gate dielectric layer and a gate electrode, channel layers spaced apart from each other in a third direction perpendicular to an upper surface of the substrate on the active region and surrounded by the gate structure, a lateral structure disposed on internal side surfaces of the gate dielectric layer and contacting the gate dielectric layer and the gate electrode, and source/drain regions disposed in regions in which the active region is recessed on opposite sides of the gate structure, and connected to the channel layers. A level of lower surfaces of the lateral structures is higher than a level of a lower surface of the gate electrode.