The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 03, 2026
Filed:
Sep. 14, 2023
Samsung Electronics Co., Ltd., Suwon-si, KR;
Jeonil Lee, Suwon-si, KR;
Kyunghwan Lee, Suwon-si, KR;
SAMSUNG ELECTRONICS CO., LTD., Suwon-si, KR;
Abstract
A semiconductor device includes a substrate. A plurality of horizontal structures is stacked on the substrate and spaced apart from each other. A plurality of vertical structures penetrates through the plurality of horizontal structures. Each of the plurality of vertical structures includes a vertical source line, a vertical bit line, a channel layer, and a dielectric layer. The channel layer is in direct contact with the vertical source line and the vertical bit line. The dielectric layer is disposed between the plurality of horizontal structures and the channel layer. Each of the plurality of horizontal structures includes a first conductive layer, a ferroelectric layer surrounding at least a portion of the first conductive layer, and a second conductive layer disposed between the ferroelectric layer and the dielectric layer.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile