The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 03, 2026
Filed:
Mar. 25, 2022
Shimadzu Corporation, Kyoto, JP;
SHIMADZU CORPORATION, Kyoto, JP;
Abstract
A mass spectrometry method in which a precursor ion is introduced into a reaction chamber (step), a radical is generated in a radical generation chamber, the precursor ion is irradiated with the radical to generate a product ion (step), and a mass of the product ion is measured (step) includes, when generating the radical, introducing a material gas into the radical generation chamber (stepsand), supplying radio-frequency power to the material gas simultaneously with or after introducing the precursor ion into the reaction chamber (stepsand), and supplying an electron to the material gas in a state where the radio-frequency power is supplied to generate plasma emission, and irradiating the material gas with the plasma emission to generate the radical (stepsand).
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile