The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 03, 2026

Filed:

Jun. 14, 2023
Applicant:

Applied Materials, Inc., Santa Clara, CA (US);

Inventors:

Amit Sahu, Bangalore, IN;

Shashidhara Patel H B, Bangalore, IN;

Muhannad Mustafa, Milpitas, CA (US);

Rakesh Ramadas, San Jose, CA (US);

Sanjeev Baluja, Campbell, CA (US);

Assignee:

Applied Materials, Inc., Santa Clara, CA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01J 37/32 (2006.01); H10P 72/00 (2026.01);
U.S. Cl.
CPC ...
H01J 37/3244 (2013.01); H01J 37/32357 (2013.01); H10P 72/0402 (2026.01); H01J 2237/002 (2013.01); H01J 2237/332 (2013.01);
Abstract

Cooling flanges and semiconductor manufacturing processing chamber comprising the cooling flanges are disclosed. The cooling flanges comprise a flange body with a gas channel extending through the length thereof. The gas channel has an inlet funnel, a middle channel and an outlet funnel with a purge gas inlet in a side of the flange body. The purge gas inlet connects to the middle channel of the gas channel.


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Sahu, Amit. (2026). Semiconductor manufacturing process chamber cooling flange for remote plasma source supply (U.S. Patent No. 12785044). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/12785044

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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