The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 03, 2026

Filed:

Jul. 28, 2022
Applicant:

Google Llc, Mountain View, CA (US);

Inventors:

Yu Zhang, Mountain View, CA (US);

Yu-An Chung, Mountain View, CA (US);

Wei Han, Mountain View, CA (US);

Chung-Cheng Chiu, Mountain View, CA (US);

Weikeng Qin, Sunnyvale, CA (US);

Ruoming Pang, New York, NY (US);

Yonghui Wu, Palo Alto, CA (US);

Assignee:

GOOGLE LLC, Mountain View, CA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G06N 3/045 (2023.01); G06N 3/0455 (2023.01);
U.S. Cl.
CPC ...
G06N 3/0455 (2023.01);
Abstract

Provided are improved end-to-end self-supervised pre-training frameworks that leverage a combination of contrastive and masked modeling loss terms. In particular, the present disclosure provides framework that combines contrastive learning and masked modeling, where the former trains the model to discretize input data (e.g., continuous signals such as continuous speech signals) into a finite set of discriminative tokens, and the latter trains the model to learn contextualized representations via solving a masked prediction task consuming the discretized tokens. In contrast to certain existing masked modeling-based pre-training frameworks which rely on an iterative re-clustering and re-training process or other existing frameworks which concatenate two separately trained modules, the proposed framework can enable a model to be optimized in an end-to-end fashion by solving the two self-supervised tasks (the contrastive task and masked modeling) simultaneously.


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Zhang, Yu. (2026). Contrastive learning and masked modeling for end-to-end self-supervised pre-training (U.S. Patent No. 12783853). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/12783853

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