Metastructure optical elements, metastructure optical assemblies, and methods of manufacturing the same

Abstract

The present disclosure describes apparatus including a metastructure optical element and methods for manufacturing metastructure optical elements. An example method includes providing a substrate having an optical etch-deceleration layer thereon, and a stratum over the optical etch-deceleration layer. The method further includes forming a mask on the stratum, and etching the stratum and the optical etch-deceleration layer to form a plurality of groupings of meta-atoms. An amount of etching into the optical etch-deceleration layer differs for each of the each groupings of meta-atoms, such that a first one of the groupings of meta-atoms is composed of first portions of the stratum, and a second one of the groupings of meta-atoms is composed of second portions of the etched stratum and underlying portions of the optical etch-deceleration layer. The method further includes removing the mask, and encapsulating the first and second groupings of meta-atoms in a material that is index-matched to the optical etch-deceleration layer.