The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 03, 2026
Filed:
Jul. 25, 2023
Safran Landing Systems, Velizy-Villacoublay, FR;
Centre National DE LA Recherche Scientifique, Paris, FR;
Centrale Lille Institut, Villeneuve d'Ascq, FR;
Ecole Nationale Superieure DE Chimie DE Lille, Villeneuve d'Ascq, FR;
Universite DE Lille, Lille, FR;
Guillaume Rousseau, Balma, FR;
Fanny Alousque, Moissy-Cramayel, FR;
François Mear, Villeneuve d'Ascq Cedex, FR;
Lionel Montagne, Villeneuve d'Ascq Cedex, FR;
SAFRAN LANDING SYSTEMS, Velizy-Villacoublay, FR;
CENTRE NATIONAL DE LA RECHERCHE SCIENTIFIQUE, Paris, FR;
CENTRALE LILLE INSTITUT, Villeneuve d'Ascq, FR;
UNIVERSITE DE LILLE, Lille, FR;
Abstract
A method for protection against oxidation of a composite material part includes carbon, the method including impregnating an internal porosity of the part with an impregnation composition including, as percentages by weight: (i) between 1% and 60% of colloidal silica; (ii) between 0.5% and 20% of a flux precursor including at least one nitrate of an alkali metal M1; (iii) between 0.5% and 20% of a lattice modifying precursor, including at least one nitrate or one oxynitrate of an element M2 which is chosen from metals or lanthanides; and (iv) between 20% and 88% of water; and carrying out a vitrification heat treatment on the part impregnated with the impregnation composition so as to obtain a glass for protection against oxidation including at least silica, an oxide of M1 and an oxide of M2.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile