The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 03, 2026
Filed:
Dec. 14, 2022
Applicant:
Commissariat À L'energie Atomique ET Aux Energies Alternatives, Paris, FR;
Inventors:
Rémy Gassilloud, Grenoble Cedex, FR;
Stéphane Cadot, Grenoble Cedex, FR;
Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23C 16/30 (2006.01); C01G 41/00 (2006.01); C23C 16/34 (2006.01); C23C 16/50 (2006.01); C23C 16/56 (2006.01);
U.S. Cl.
CPC ...
C23C 16/305 (2013.01); C01G 41/006 (2013.01); C23C 16/34 (2013.01); C23C 16/50 (2013.01); C23C 16/56 (2013.01);
Abstract
A method is for depositing a thin tungsten and/or molybdenum sulfide film on a substrate chemically, under vacuum.
Quick Actions:
Gassilloud, Rémy. (2026). Chemical vacuum deposition of a thin tungsten and/or molybdenum sulfide film method (U.S. Patent No. 12781340). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/12781340
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile