The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 03, 2026

Filed:

Jun. 28, 2024
Applicants:

Kabushiki Kaisha Toshiba, Tokyo, JP;

Tohoku University, Sendai, JP;

Inventors:

Kenya Uchida, Yokohama, JP;

Hiroyuki Fukui, Yokkaichi, JP;

Ikuo Uematsu, Yokohama, JP;

Takeaki Iwamoto, Sendai, JP;

Eunsang Kwon, Sendai, JP;

Assignees:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23C 16/30 (2006.01); A62D 3/36 (2007.01); A62D 101/40 (2007.01); C23C 16/44 (2006.01); C23C 16/56 (2006.01); C30B 19/10 (2006.01); C30B 19/12 (2006.01); H10P 72/00 (2026.01);
U.S. Cl.
CPC ...
C23C 16/30 (2013.01); A62D 3/36 (2013.01); C23C 16/56 (2013.01); C30B 19/10 (2013.01); C30B 19/12 (2013.01); H10P 72/0402 (2026.01); A62D 2101/40 (2013.01); C23C 16/4412 (2013.01);
Abstract

According to one embodiment, a treatment method may include making a byproduct come into contact with a treatment solution, wherein the byproduct is a solid or liquid byproduct formed by polymerizing components contained in an exhaust gas discharged by synthesizing a silicon-containing material using a gas which includes silicon and halogen. The treatment solution may include at least one of an inorganic base or an organic base, and is basic.


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Uchida, Kenya. (2026). Treatment solution and treatment method (U.S. Patent No. 12781339). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/12781339

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