The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 03, 2026

Filed:

Dec. 15, 2022
Applicant:

Samsung Electronics Co., Ltd., Suwon-si, KR;

Inventors:

Changjun Park, Hwaseong-si, KR;

Jaesung Lee, Seongnam-si, KR;

Junghun Lim, Seongnam-si, KR;

Mihyun Park, Seoul, KR;

Sangwon Bae, Suwon-si, KR;

Jungmin Oh, Incheon, KR;

Hyosan Lee, Seongnam-si, KR;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
C09K 13/06 (2006.01); C23F 1/30 (2006.01); H10P 14/40 (2026.01); H10P 50/66 (2026.01); H10W 20/00 (2026.01);
U.S. Cl.
CPC ...
C09K 13/06 (2013.01); C23F 1/30 (2013.01); H10P 14/412 (2026.01); H10P 50/667 (2026.01); H10W 20/056 (2026.01);
Abstract

An etching composition for etching a molybdenum film, the etching composition includes about 0.1 wt % to about 5 wt % of an oxidant; about 10 wt % to about 40 wt % of a chelating agent, the chelating agent including a mineral acid; about 0.01 wt % to about 3 wt % of a corrosion inhibitor, the corrosion inhibitor including an ammonium salt, an amine compound, or a combination thereof; and an organic solvent, all wt % being based on a total weight of the etching composition.


Find Patent Forward Citations

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Park, Changjun. (2026). Etching composition for etching molybdenum film and method of manufacturing integrated circuit device using the same (U.S. Patent No. 12781125). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/12781125

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