The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 03, 2026
Filed:
Jul. 22, 2020
Applicant:
Merck Patent Gmbh, Darmstadt, DE;
Inventors:
Daishi Yokoyama, Kakegawa, JP;
Atsuko Noya, Kakegawa, JP;
Cho-Ying Lin, Hukou Township, TW;
Yung-Cheng Chang, Hukou Township, TW;
Assignee:
Merck Patent GmbH, Darmstadt, DE;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C09D 183/08 (2006.01); G03F 7/032 (2006.01); G03F 7/075 (2006.01); G03F 7/16 (2006.01); H10P 14/692 (2026.01);
U.S. Cl.
CPC ...
C09D 183/08 (2013.01); G03F 7/032 (2013.01); G03F 7/0757 (2013.01); G03F 7/168 (2013.01); H10P 14/6922 (2026.01);
Abstract
To provide a negative type photosensitive composition having excellent chemical resistance and capable of being cured at a low temperature. A negative type photosensitive composition comprising (I) a polysiloxane having a specific structure, (II) a polymerization initiator, (III) a compound containing two or more (meth)acryloyloxy groups, and (IV) a solvent.
Quick Actions:
Yokoyama, Daishi. (2026). Low-temperature curable negative type photosensitive composition (U.S. Patent No. 12781089). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/12781089
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile