The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 03, 2026
Filed:
Apr. 25, 2023
Fujifilm Sonosite, Inc., Bothell, WA (US);
FUJIFILM SonoSite, Inc., Bothell, WA (US);
Abstract
Systems and methods for an ultrasound scanner with an impact-resistance system are described. In some implementations, the impact-resistance system reduces acceleration components associated with an impact force applied to an enclosure of the ultrasound scanner or directly to an acoustic lens of a transducer array of the ultrasound scanner. The impact-resistance system distributes the acceleration components from the transducer array to the enclosure via couplings with soft and elastic materials. Some of the couplings may be located between the enclosure and elongated members embedded in backing material of the transducer array. Some of the couplings may be located between the enclosure and a flange that extends from the acoustic lens into a channel in the enclosure. Implementing the impact-resistance system described herein improves reliability of the transducer array without sacrificing performance or usability, particularly for ultraportable scanners.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile