The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 27, 2026

Filed:

Oct. 29, 2021
Applicant:

Boe Technology Group Co., Ltd., Beijing, CN;

Inventors:

Yingwei Liu, Beijing, CN;

Ke Wang, Beijing, CN;

Zhanfeng Cao, Beijing, CN;

Qi Yao, Beijing, CN;

Guangcai Yuan, Beijing, CN;

Yuelei Xiao, Beijing, CN;

Yue Li, Beijing, CN;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H10W 20/40 (2026.01); H10W 44/00 (2026.01); H10W 70/685 (2026.01); H10W 72/30 (2026.01);
U.S. Cl.
CPC ...
H10W 44/601 (2026.01); H10W 20/497 (2026.01); H10W 70/685 (2026.01); H10W 72/357 (2026.01); H10W 72/367 (2026.01);
Abstract

The present disclosure provides a base plate integrating passive devices and a method for manufacturing the same, which relate to the technical field of radio frequency devices. The base plate integrating passive devices of the present disclosure includes a substrate base plate and the passive devices disposed on the substrate base plate, the passive devices including at least an inductor, the inductor including a plurality of open ring portions arranged and connected in sequence in a direction away from the base plate, wherein an interlayer dielectric layer is disposed between the open ring portions disposed adjacently, and the open ring portions disposed adjacently are electrically connected through a first via hole penetrating the interlayer dielectric layer; orthographic projections of any two of the open ring portions on the substrate base plate at least partially overlap.


Find Patent Forward Citations

Liu, Yingwei. (2026). High integration substrate integrated with passive device, and production method therefor (U.S. Patent No. 12777944). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/12777944

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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