The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 27, 2026

Filed:

Jan. 18, 2022
Applicant:

Screen Holdings Co., Ltd., Kyoto, JP;

Inventors:

Kana Tahara, Kyoto, JP;

Yukifumi Yoshida, Kyoto, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H10P 50/28 (2026.01); H10P 14/60 (2026.01); H10P 70/00 (2026.01); H10P 72/00 (2026.01);
U.S. Cl.
CPC ...
H10P 50/283 (2026.01); H10P 14/6309 (2026.01); H10P 70/23 (2026.01); H10P 72/0424 (2026.01);
Abstract

A substrate processing method includes a substrate preparation step of preparing a substrate having a major surface from which a first oxide layer is exposed, a first etching step of forming a first polymer film that contains a first acid polymer on the major surface of the substrate and etching the substrate, and a first rinsing step of supplying a first rinsing liquid that washes the major surface of the substrate to the major surface of the substrate after the first etching step.


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Tahara, Kana. (2026). Substrate treatment method and substrate treatment device (U.S. Patent No. 12777860). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/12777860

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