The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 27, 2026
Filed:
Oct. 23, 2023
China University of Geosciences (Beijing), Beijing, CN;
Tibet Julong Copper Co., Ltd., Lhasa, CN;
Youye Zheng, Beijing, CN;
Lei Li, Beijing, CN;
Xiaofang Dou, Beijing, CN;
Zhixin Zhang, Lhasa, CN;
Jinling Liao, Lhasa, CN;
Qiong Ci, Lhasa, CN;
Song Wu, Beijing, CN;
Xiaofeng Liu, Lhasa, CN;
Jingjing Li, Lhasa, CN;
Peng Kang, Lhasa, CN;
CHINA UNIVERSITY OF GEOSCIENCES (BEIJING), Beijing, CN;
Tibet Julong Copper Co., Ltd., Lhasa, CN;
Abstract
The present invention discloses a method for evaluating a metallogenic potential of a skarn deposit based on the magnetite composition, including collecting geological, geophysical, geochemical, and remote sensing data in a studying area, systematically, and delineating a favorable area for mineralization; collecting magnetite-bearing samples in the favorable area for mineralization, and describing the lithology, alteration and mineralization characteristics of each sample; selecting the most representative magnetite samples for chemical analysis to obtain average contents of trace elements Ti, Ni, V, K and Al+Si+Mg, denoted as c(Ti), c(Ni), c(V), c(K), and c(Al+Si+Mg) in ppm; and calculating discriminant factors F1, F2, F3, and F4 by substituting data, and performing discrimination; and when the four discriminant factors all discriminate the metallogenic potential to be better, determining the skarn deposit in the favorable area for mineralization to have a good metallogenic potential; and discriminating as a poor metallogenic potential in the remaining cases.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile