The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 27, 2026
Filed:
Mar. 22, 2024
Shanghai United Imaging Healthcare Co., Ltd., Shanghai, CN;
Biao Li, Shanghai, CN;
Yanyan Liu, Shanghai, CN;
SHANGHAI UNITED IMAGING HEALTHCARE CO., LTD., Shanghai, CN;
Abstract
A method and a system for training an initial artifact removal model may be provided. One or more first initial images, one or more objective feature maps corresponding to the one or more first initial images, and one or more reference images corresponding to the one or more first initial images may be obtained. A trained artifact removal model may be generated by training the initial artifact removal model using the one or more first initial images, the one or more objective feature maps, and the one or more reference images.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile