Real-time patterning hotspot analyzer

Abstract

This application discloses a hotspot identification system to generate process variability bands for structures of an integrated circuit capable of being fabricated utilizing at least one lithographic mask based, at least in part, on a mask layout data describing the lithographic mask and a distribution of manufacturing parameters during fabrication. The hotspot identification system can utilize the process variability bands to identify a subset of the structures that correspond to hotspots in the integrated circuit and identify corresponding values for the manufacturing parameters associated with the identified hotspots. A wafer testing system can implement a real-time wafer assessment process by comparing measured manufacturing parameters associated with a fabricated integrated circuit to the values for the manufacturing parameters associated with the identified hotspots, and dynamically identifying a disposition for the fabricated integrated circuit corresponding to one or more structures associated with the identified hotspot based on the comparison.