The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 27, 2026
Filed:
Sep. 18, 2024
Samsung Electronics Co., Ltd., Suwon-si, KR;
Kyoungwhan Oh, Suwon-si, KR;
Donghyeong Kim, Suwon-si, KR;
Eunhee Jeang, Suwon-si, KR;
Iksun Park, Suwon-si, KR;
Dahae Lee, Suwon-si, KR;
Ohkug Kwon, Suwon-si, KR;
Jeonggil Kim, Suwon-si, KR;
Jinhyuk Kim, Suwon-si, KR;
SAMSUNG ELECTRONICS CO., LTD., Suwon-si, KR;
Abstract
A semiconductor process apparatus includes an extreme ultraviolet (EUV) light source; a mask stage configured to support a mask; a substrate stage configured to support a substrate; an optical lighting system including a plurality of lighting mirrors configured to guide EUV light from the light source to the mask stage; an optical projection system including a plurality of projection mirrors configured to guide the EUV light from the mask stage to the substrate stage; a control unit configured to control the light source, the mask stage, the substrate stage, the optical lighting system, and the optical projection system; and an optical intensity adjuster configured to adjust the intensity of the EUV light. A first lighting mirror includes a plurality of unit mirrors, and the control unit is configured to measure a degree of degradation of each unit mirror and to replace at least one unit mirror.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile