The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 27, 2026
Filed:
Feb. 05, 2024
Samsung Electronics Co., Ltd., Suwon-si, KR;
Hyungju Ryu, Suwon-si, KR;
Dokyeong Kwon, Suwon-si, KR;
Sangjin Kim, Suwon-si, KR;
Changmin Park, Suwon-si, KR;
Samsung Electronics Co., Ltd., Suwon-si, KR;
Abstract
Methods of forming a photoresist pattern are provided. A photoresist layer may be formed on a substrate. An exposure process may be performed on the photoresist layer. A post exposure baking (PEB) process may be performed on the photoresist layer with a temperature gradient in the photoresist layer in a vertical direction substantially perpendicular to an upper surface of the substrate. A development process may be performed on the photoresist layer.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile