The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 27, 2026
Filed:
Sep. 02, 2022
Applicant:
Samsung Sdi Co., Ltd., Yongin-si, KR;
Inventors:
Assignee:
Samsung SDI Co., Ltd., Yongin-si, KR;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/11 (2006.01); G03F 7/09 (2006.01); G03F 7/20 (2006.01); G03F 7/36 (2006.01); G03F 7/40 (2006.01);
U.S. Cl.
CPC ...
G03F 7/11 (2013.01); G03F 7/092 (2013.01); G03F 7/202 (2013.01); G03F 7/36 (2013.01); G03F 7/40 (2013.01);
Abstract
A hardmask composition, a hardmask layer manufactured from the hardmask composition, and a method of forming patterns from the hardmask composition, the composition includes a polymer including a structural unit represented by Chemical Formula 1 and a structural unit represented by Chemical Formula 2, and a solvent,
Kim, Yoona. (2026). Hardmask composition, hardmask layer, and method of forming patterns (U.S. Patent No. 12775212). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/12775212
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile