The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 27, 2026

Filed:

May. 25, 2023
Applicant:

Google Llc, Mountain View, CA (US);

Inventor:

Hui Son, Hayward, CA (US);

Assignee:

GOOGLE LLC, Mountain View, CA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G02B 1/10 (2015.01); G02B 27/01 (2006.01); G02B 27/14 (2006.01);
U.S. Cl.
CPC ...
G02B 1/10 (2013.01); G02B 27/0172 (2013.01); G02B 27/142 (2013.01);
Abstract

A dual-stage process is implemented to achieve a desired shape degree of flatness and parallelism of a reflective waveguide facet structure. In a first stage, a coarse substrate having two major surfaces opposite each other and a series of facets that approximate a target shape and degree of smoothness is formed. In a second stage, at least one major surface of the coarse substrate is coated with a veneer, and the veneer is shaped using a mold formed by a high-precision tool such as a diamond turned tool to the target shape and flatness of the series of facets. After the veneer is shaped to the desired shape and degree of flatness, the veneer is coated with a reflective coating and the series of facets is embedded in plastic.


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Son, Hui. (2026). High precision facet structures for reflective waveguides (U.S. Patent No. 12775121). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/12775121

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