The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 27, 2026

Filed:

Feb. 15, 2022
Applicant:

Applied Materials, Inc., Santa Clara, CA (US);

Inventors:

Vijay D. Parkhe, San Jose, CA (US);

Ashutosh Agarwal, San Jose, CA (US);

Assignee:

Applied Materials, Inc., Santa Clara, CA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01J 37/32 (2006.01); C23C 16/458 (2006.01); H10P 72/72 (2026.01);
U.S. Cl.
CPC ...
C23C 16/4586 (2013.01); H01J 37/32724 (2013.01); H10P 72/722 (2026.01);
Abstract

Electrostatic chucks (ESCs) for plasma processing chambers, and methods of fabricating ESCs, are described. In an example, a substrate support assembly includes a ceramic bottom plate, a ceramic top plate, and a bond layer between the ceramic top plate and the ceramic bottom plate, the ceramic top plate in direct contact with the bond layer, and the bond layer in direct contact with the ceramic bottom plate. A metal shaft is coupled to the ceramic bottom plate at a side of the ceramic bottom plate opposite the bond layer.


Find Patent Forward Citations

Parkhe, Vijay. (2026). Electrostatic chuck with metal shaft (U.S. Patent No. 12774524). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/12774524

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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