The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 27, 2026
Filed:
Jun. 07, 2024
Applied Materials, Inc., Santa Clara, CA (US);
Dan Zhu, Santa Clara, CA (US);
Thilini Ekanayaka, Santa Clara, CA (US);
Ruiyun Huang, Santa Clara, CA (US);
Yuxing Zhang, Santa Clara, CA (US);
Jun Feng, Santa Clara, CA (US);
Abhijit Kangude, Fremont, CA (US);
Xinhai Han, Santa Clara, CA (US);
Applied Materials, Inc., Santa Clara, CA (US);
Abstract
In an embodiment, a method for processing a substrate is provided. The method includes flowing a processing gas comprising a hydrocarbon precursor gas into a processing volume of a process chamber, heating and maintaining the substrate support at a processing temperature of less than about 450° C., applying a dual radio frequency (RF) power to generate a deposition plasma for depositing a carbon film on the substrate, and performing an annealing process to anneal the carbon film deposited on the substrate.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile