The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 27, 2026
Filed:
Apr. 09, 2024
Acushnet Company, Fairhaven, MA (US);
Courtney N. Engle, Fall River, MA (US);
John S. Dytko, Derby, CT (US);
Michael R. Madson, Easton, MA (US);
Acushnet Company, Fairhaven, MA (US);
Abstract
Various aspects of a dimple pattern methodology, and dimple pattern configurations are disclosed herein. A spherical quadrilateral segment division can be used to maintain a high level of symmetry in the dimple pattern while also maintaining a specific dimple layout in polar regions of the golf ball. In one aspect, the specific configurations disclosed herein can provide geometric symmetry while being adaptable to relatively complex processes for forming golf ball covers. Furthermore, the configurations disclosed herein provide a dimple pattern with a high level of symmetry having a particular subset of preferred polar dimples.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile