The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 27, 2026
Filed:
May. 08, 2023
Ion Beam Applications, Louvain-la-neuve, BE;
Rudi Labarbe, Louvain-la-neuve, BE;
Lucian Hotoiu, Louvain-la-neuve, BE;
Arnaud Pin, Louvain-la-neuve, BE;
Ion Beam Applications, Louvain-la-neuve, BE;
Abstract
A computer implemented method for optimizing tolerance values of operating parameters of a particle accelerating system allowing a plurality of beamlets of particles accelerated along an irradiation axis, to deposit doses by pencil beam scanning into a structure of interest of a patient according to a treatment plan. The method calculates the dose (rate) volume histograms for a statistically representative number N of values randomly selected within a defined confidence level in preselected tentative statistical distributions of the operating parameters and compares the obtained calculated dose (rate) volume histogram with an acceptable band of variation of a target dose (rate) volume histogram. Once a tentative statistical distribution yields N calculated dose (rate) volume histograms which all fall within the acceptable band of variation, it is set as the final statistical distribution, and the particle accelerating system can be programmed with the final statistical distribution.
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