The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 20, 2026
Filed:
Aug. 13, 2024
Screen Holdings Co., Ltd., Kyoto, JP;
Takashi Izuta, Kyoto, JP;
SCREEN Holdings Co., Ltd., Kyoto, JP;
Abstract
A substrate processing method includes a first chemical liquid step of supplying a first chemical liquid to the substrate, a rinsing step of supplying a rinse liquid to the substrate, a removal step of rotating the substrate in a state in which the supply of the rinse liquid is stopped, and discharging the rinse liquid from a recess portion, and removing the rinse liquid from the substrate, and a second chemical liquid step of supplying a second chemical liquid to the substrate from which the rinse liquid has been removed. In the first chemical liquid step, the first chemical liquid discharged from the rotating substrate is received by a first guard. In the rinsing step, the first guard is switched to a second guard. In the removal step and in the second chemical liquid step, the first rinse liquid and the second chemical liquid discharged from the rotating substrate are received by the second guard.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile