The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 20, 2026

Filed:

Feb. 01, 2024
Applicant:

Applied Materials, Inc., Santa Clara, CA (US);

Inventors:

Shashidhara Patel H B, Bangalore, IN;

Amit Sahu, Bangalore, IN;

Muhannad Mustafa, Milpitas, CA (US);

Sanjeev Baluja, Campbell, CA (US);

Yixiong Yang, Fremont, CA (US);

Srinivas Gandikota, Santa Clara, CA (US);

Assignee:

Applied Materials, Inc., Santa Clara, CA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23C 16/455 (2006.01); H01J 37/32 (2006.01); H10P 72/76 (2026.01);
U.S. Cl.
CPC ...
H01J 37/32642 (2013.01); C23C 16/45544 (2013.01); H10P 72/7606 (2026.01); H01J 2237/332 (2013.01);
Abstract

Process kits for semiconductor manufacturing processing chambers and semiconductor manufacturing processing chambers using the process kits are described. The process kits include an edge ring with a lower annular ring portion having a plurality of annularly spaced edge ring fins extending upwardly from the top surface of the lower annular ring portion. A liner has an inwardly directed annular extension with annularly spaced liner fins extending downwardly from the bottom surface of the inwardly directed annular extension. The edge ring fins and liner fins interdigitate without contacting to form a tortuous flow path.


Find Patent Forward Citations

Patel H B, Shashidhara. (2026). Liner and edge ring to prevent gas diffusion (U.S. Patent No. 12770838). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/12770838

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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