The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 20, 2026

Filed:

Feb. 26, 2021
Applicant:

Sst Inc., Chiba, JP;

Inventor:

Toshiyuki Takamatsu, Chiba, JP;

Assignee:

SST INC., Chiba, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01J 37/32 (2006.01); H05H 1/46 (2006.01);
U.S. Cl.
CPC ...
H01J 37/32229 (2013.01); H01J 37/32192 (2013.01); H01J 37/32467 (2013.01); H01J 2237/327 (2013.01); H05H 1/46 (2013.01); H05H 1/4622 (2021.05);
Abstract

A high frequency reaction processing apparatus and a high frequency reaction processing system capable of reducing a loss of energy of an electromagnetic wave continuously returning to and passing through a propagation line in a loop are provided. A dielectric outer container, a covering conductormade of a conductive material and kept at the same potential as ground potential of a high frequency waveguide to form a spatial region with an outer surface of the dielectric outer container, at least one high frequency wave coupling portion, and at least one dielectric inner containerare comprised.


Find Patent Forward Citations

Takamatsu, Toshiyuki. (2026). High frequency reaction processing apparatus and high frequency reaction processing system (U.S. Patent No. 12770830). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/12770830

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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