The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 20, 2026
Filed:
Apr. 10, 2024
Applicant:
Samsung Electronics Co., Ltd., Suwon-si, KR;
Inventors:
Sang Chul Yeo, Suwon-si, KR;
Jae Won Yang, Suwon-si, KR;
Assignee:
Samsung Electronics Co., Ltd., Gyeonggi-do, KR;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G06K 9/00 (2022.01); G06T 7/00 (2017.01);
U.S. Cl.
CPC ...
G06T 7/001 (2013.01); G06T 2207/20081 (2013.01); G06T 2207/30148 (2013.01);
Abstract
A method for generating a proximity correction model which is performed by a computing system is provided. The method comprises acquiring a plurality of shot images on a wafer after performing a first process using a first layout, generating an overlap image obtained by overlap of the plurality of shot images, and performing machine learning on the proximity correction model, using an image of the first layout and the overlap image.
Quick Actions:
Yeo, Sang. (2026). Method for generating proximity correction model, method for processing proximity correction using generated proximity correction model and proximity correction system thereof (U.S. Patent No. 12770249). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/12770249
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