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The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 12769219 B1

PDFFull Text
Date of Patent:
Oct. 20, 2026

Filed:

Jul. 15, 2024

Imprint apparatus, imprint method, and article manufacturing method

Applicant:

Canon Kabushiki Kaisha, Tokyo, JP;

Inventor:

Nozomu Hayashi, Tochigi, JP;

Assignee:

CANON KABUSHIKI KAISHA, Tokyo, JP;

Attorney:

ROSSI, KIMMS & McDOWELL LLP

Primary Examiner:

Leo B Tentoni

Int. Cl.
CPC ...
B29C 41/02 (2006.01); B29C 37/00 (2006.01); B29C 41/38 (2006.01); B29C 41/52 (2006.01); B29C 43/36 (2006.01); B29C 59/00 (2006.01); B29C 59/02 (2006.01); G03F 7/00 (2006.01); G03F 9/00 (2006.01); B29C 43/02 (2006.01); B29C 43/58 (2006.01);
U.S. Cl.
CPC ...
G03F 9/7042 (2013.01); B29C 37/0053 (2013.01); B29C 59/002 (2013.01); B29C 59/02 (2013.01); G03F 7/0002 (2013.01); G03F 9/7023 (2013.01); G03F 9/7065 (2013.01); G03F 9/7069 (2013.01); G03F 9/7088 (2013.01); B29C 2037/90 (2013.01); B29C 2043/025 (2013.01); B29C 2043/5833 (2013.01); B29C 2043/5891 (2013.01); B29K 2907/00 (2013.01); B29K 2909/08 (2013.01);
Abstract

An imprint apparatus that can curb a decrease in throughput is provided. The imprint apparatus curs and forms a pattern of an imprint material sequentially in a plurality of shot areas on a substrate using a mold including a patterned part and includes: an alignment measurement unit configured to measure a relative position between the substrate and the mold by detecting a mark formed on the substrate and a mark formed on the mold; an alignment illumination unit including a light amount adjusting mechanism for adjusting a light amount of light emitted from a light source and configured to illuminate a marks on the mold and the substrate such that a marks are able to be detected by the alignment measurement unit; and a control unit configured to cure the imprint material in a state in which the mold and the substrate have been aligned on the basis of a measurement result from the alignment measurement unit and then to perform control such that adjustment of the light amount adjusting mechanism is started such that an illumination condition when the alignment illumination unit illuminates a shot area on which a pattern is to be next formed is satisfied.

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Hayashi, Nozomu. (2026). Imprint apparatus, imprint method, and article manufacturing method (U.S. Patent No. 12769219). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/12769219

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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