The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 20, 2026

Filed:

Nov. 03, 2023
Applicant:

Anhui University, Hefei City, CN;

Inventors:

Guoda Xie, Hefei City, CN;

Guilin Hou, Hefei City, CN;

Jiale Liu, Hefei City, CN;

Wenjie Ding, Hefei City, CN;

Jinpeng Dai, Hefei City, CN;

Zhixiang Huang, Hefei City, CN;

Assignee:

Anhui University, Hefei City, CN;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G01R 29/08 (2006.01); G06F 30/23 (2020.01); G06F 111/10 (2020.01);
U.S. Cl.
CPC ...
G01R 29/0807 (2013.01); G06F 30/23 (2020.01); G06F 2111/10 (2020.01);
Abstract

A method for processing anisotropic magnetized plasma medium and a system thereof are provided. The method includes obtaining the Maxwell equation and the polarization current density equation based on the electromagnetic characteristics of anisotropic magnetized plasma; processing the Maxwell equation and the polarization current density equation to obtain the electric field intensity, the magnetic field intensity, and the polarization current density after processed; based on the electric field intensity, the magnetic field intensity, and the polarization current density after processed, numerical iterative equations for electric field intensity, magnetic field intensity, and polarization current density in anisotropic magnetized plasma medium are obtained; a numerical modeling simulation electromagnetic model is used to determine the electromagnetic characteristics of the electromagnetic model. The use of the present disclosure to simulate the propagation of electromagnetic waves in anisotropic magnetized plasma medium has higher numerical calculation accuracy.


Find Patent Forward Citations

Xie, Guoda. (2026). Method for processing anisotropic magnetized plasma medium and system thereof (U.S. Patent No. 12768869). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/12768869

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