The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 20, 2026

Filed:

Aug. 12, 2024
Applicant:

The Government of the United States of America, As Represented BY the Secretary of the Navy, Arlington, VA (US);

Inventors:

Andrew J. Birnbaum, Washington, DC (US);

John C. Steuben, Washington, DC (US);

Anna Lee Kofer Rawlings, Alexandria, VA (US);

Benjamin D. Graber, College Park, MD (US);

Athanasios Iliopoulos, Bethesda, MD (US);

John G. Michopoulos, Millsboro, DE (US);

Heonjune Ryou, Hanover, MD (US);

Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
G01N 3/06 (2006.01); G01N 3/08 (2006.01);
U.S. Cl.
CPC ...
G01N 3/068 (2013.01); G01N 3/08 (2013.01); G01N 2203/0226 (2013.01);
Abstract

A non-contact material assessment system and method are provided. In embodiments, a system includes: a radiation source generating a pattern of diffracted elements; a detector configured to: capture a first image of a first diffracted element when a sample is in an initial state, and a second image when the sample is in a second state; and capture a first image of a second diffracted element when the sample is in the initial state, and a second image when the sample is in the second state; and a controller to: determine a displacement of the first diffracted element based on the first and second images of the first diffracted element; determine a displacement of the second diffracted element based on the first and second images of the second diffracted element; and determine a characteristic of the sample over based on the displacement of the first and second diffracted elements.


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Birnbaum, Andrew. (2026). Non-contact, autogenous material assessment (U.S. Patent No. 12768760). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/12768760

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