The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 20, 2026

Filed:

Jan. 25, 2022
Applicant:

Hanwha Solutions Corporation, Seoul, KR;

Inventors:

Namjin Jang, Daejeon, KR;

Ji Hye Choi, Daejeon, KR;

Jinho Park, Daejeon, KR;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C07C 25/02 (2006.01);
U.S. Cl.
CPC ...
C07C 25/02 (2013.01);
Abstract

The present invention relates to a method for chlorinating an aromatic compound and, more specifically, to a method for chlorinating an aromatic compound to prevent the phenomenon of decreased responsiveness due to foam generation, and to prevent counterflow of a fluid. By means of the method for chlorinating an aromatic compound according to the present invention, a plurality of column-type reactors are connected in series so that reaction products produced in a former reactor are inserted to a latter reactor, and chlorine gas is inserted in equal measure at the bottom of each reactor. Accordingly, a chlorination reaction occurs in each of the reactors, and hydrogen chloride gas generated in each of the reactors is exhausted from each of the reactors.


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Jang, Namjin. (2026). Method for chlorinating aromatic compound (U.S. Patent No. 12767622). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/12767622

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