The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 20, 2026
Filed:
Dec. 12, 2023
Konica Minolta, Inc., Tokyo, JP;
Kazunari Tada, Hachioji, JP;
KONICA MINOLTA, INC., Tokyo, JP;
Abstract
A manufacturing method of a functional membrane which contains an inorganic material and has a fine uneven structure on a surface thereof, includes a single mask forming step and an etching step, wherein a plurality of protruding portions which constitute the fine uneven structure are formed in a stair shape having one or more stairs in a vertical cross-sectional shape of the functional membrane along a thickness direction of the functional membrane, when Mohs hardness of the inorganic material is denoted as X and the number of the stairs of the protruding portions is denoted as Y, 10≤X×Y, and an average height from the lowest bottom surface of the protruding portions of the lowermost stair to the highest top surface of the protruding portions of the uppermost stair is 1 μm or less.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile