The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 20, 2026
Filed:
Jun. 16, 2023
Shenzhen University, Shenzhen, CN;
Shuxian Hong, Shenzhen, CN;
Biqin Dong, Shenzhen, CN;
Lei Zeng, Shenzhen, CN;
Feng Xing, Shenzhen, CN;
Peiyu Chen, Shenzhen, CN;
SHENZHEN UNIVERSITY, Shenzhen, CN;
Abstract
The present disclosure provides a universal preparation method for in-situ growth of a layered double hydroxide (LDH) layer on a substrate surface, and belongs to the technical field of material synthesis. In the present disclosure, an LDH protective layer is grown in situ on a surface of a substrate by means of electrodeposition combined with hydrothermal treatment. Specifically, a seed crystal layer of the LDH is formed on the substrate surface by the electrodeposition, and then obtained LDH seed crystals are crystallized and grown by Ostwald ripening through the hydrothermal treatment. In this way, the LDH protective layer is formed in which an interlayer anion is a nitrate. The protective layer protects the substrate against corrosion. Moreover, since the interlayer anion is the nitrate, the protective layer can be exchanged with other corrosion-inhibiting anions, and is modifiable.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile