The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 13, 2026
Filed:
Sep. 29, 2023
Spts Technologies Limited, Newport, GB;
Binte Kazemi Samira, Newport, GB;
SPTS Technologies Limited, Newport, GB;
Abstract
An additive-containing aluminium nitride film is plasma etched. The additive-containing aluminium nitride film contains an additive element selected from scandium (Sc), yttrium (Y) or erbium (Er). A plasma is established within the chamber to plasma etch the additive-containing aluminium nitride film exposed within the trench. A ratio of the inert diluent gas flow rate to the sum of the BCland Clflow rates is in the range 0.45:1 to 0.75:1 and a ratio of the BClflow rate to the Clflow rate is in the range 0.75:1 to 1.25:1.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile