The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 13, 2026

Filed:

Aug. 25, 2023
Applicant:

Kokusai Electric Corporation, Tokyo, JP;

Inventors:

Yasunobu Koshi, Toyama, JP;

Kazuhiro Harada, Toyama, JP;

Yuji Urano, Toyama, JP;

Shingo Nohara, Toyama, JP;

Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
C23C 16/34 (2006.01); C23C 16/44 (2006.01); C23C 16/52 (2006.01); H10P 14/60 (2026.01); H10P 14/694 (2026.01);
U.S. Cl.
CPC ...
H10P 14/6334 (2026.01); C23C 16/345 (2013.01); C23C 16/4404 (2013.01); C23C 16/4405 (2013.01); C23C 16/52 (2013.01); H10P 14/69433 (2026.01);
Abstract

Included are processes of (a) supplying a film-forming gas into a processing container in which a substrate is accommodated to form a film on the substrate, (b) supplying a fluorine-containing gas into the processing container in which the substrate is not accommodated to remove a deposit including the film adhered to the inside of the processing container, (c) supplying a precoat gas into the processing container in which the substrate is not accommodated and from which the deposit is removed to form a precoat film in the processing container, and (d) supplying a film-forming gas into the processing container in which a substrate is accommodated and in which the precoat film is formed to form a film on the substrate, in which, in (c), a film thickness distribution of the precoat film is adjusted in accordance with a distribution of a residual fluorine concentration in the processing container.


Find Patent Forward Citations

Koshi, Yasunobu. (2026). Processing method, method of manufacturing semiconductor device, processing apparatus, and recording medium (U.S. Patent No. 12765280). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/12765280

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Loading…