Gate-all-around transistor with hybrid conduction mechanism and manufacturing method thereof

Abstract

A gate-all-around transistor with hybrid conduction mechanism, including a GAA MOSFET, a second source region, and a second drain region. The GAA MOSFET includes a substrate, a first source region, and a first drain region. The first source region, the first drain region and the second drain region are doped with first ions, the second source region is doped with second ions. The second source region is formed between the substrate and the first source region, the second drain region is formed between the substrate and the first drain region. The height of the second source region and the second drain region are not less than the height of the substrate between the first source region and the first drain region. It can realize the hybrid conduction of the gate channel diffusion drift current and the bottom channel band tunneling current to obtain better ultra-steep switching characteristics.