The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 13, 2026
Filed:
Jul. 26, 2024
Veeco Instruments Inc., Plainview, NY (US);
Mohammad Saghayezhian, Plainview, NY (US);
Binyamin Rubin, Plainview, NY (US);
VEECO INSTRUMENTS INC., Plainview, NY (US);
Abstract
An in situ cleaning of the vessel of an ion deposition/etching system that includes utilizing the E-mode of the system and increasing plasma potential to remove material deposited on the vessel walls. The method includes operating the system with plasma only, no grid bias, minimal gas flow and high RF power level. During this cleaning mode, radially moving capacitively coupled ions impinge on the vessel inner wall, etching undesired back scattered material from the wall.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile