The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 13, 2026

Filed:

Feb. 19, 2025
Applicant:

Yang Pan, Singapore, SG;

Inventor:

Yang Pan, Singapore, SG;

Assignee:

Inspiring Atoms Pte Ltd, Singapore, SG;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01J 37/32 (2006.01); H10P 72/00 (2026.01);
U.S. Cl.
CPC ...
H01J 37/32174 (2013.01); H01J 37/3211 (2013.01); H01J 37/32146 (2013.01); H01J 2237/334 (2013.01); H10P 72/0421 (2026.01);
Abstract

Disclosed is a system and method for delivering pulsed RF power from a single generator to multiple distributed plasma sources in a semiconductor process system. A Single-Pole Multi-Throw (SPMT) switch, dynamically controlled in real time, selectively routes individual pulses or groups of pulses to designated plasma sources. Each pulse can be independently configured with specific RF power, frequency, and duration, allowing precise and adaptable power distribution to components such as the center and multiple edge coils of a transformer coupled plasma (TCP) source.


Find Patent Forward Citations

Pan, Yang. (2026). System and method for delivering pulsed rf power from a single generator to distributed plasma sources of a semiconductor process system (U.S. Patent No. 12763288). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/12763288

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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